China has reportedly built an extreme‑ultraviolet (EUV) lithography machine inside a high‑security laboratory in Shenzhen, in what sources described as a nationally coordinated push to overcome the most tightly held chokepoint in advanced chipmaking. The machine is described as operational and capable of generating EUV light, though it has yet to produce functional chips, Reuters […]
Thank you for registering!
An account was already registered with this email. Please check your inbox for an authentication link.
